CANTILEVER FABRICATION TECHNIQUE FOR ATOMIC FORCE MICROSCOPE (AFM)
Keywords:
Cantilever, CVD, AFM, Atomic Force Microscope, Lithography, Dry etch, Characterization and Thin Film exposure.Abstract
Recent innovations in the region of nanofabrication have created a distinctive prospect for
manufacturing structures in the nm range. The available span can be used to fabricate novel
electronic, optical, magnetic, mechanical, and chemical/biological devices with applications
ranging from sensors to computation and control. In this paper, introduction to major
nanofabrication techniques currently used to fabricate structures from the nm to several hundred
nm range will be discussed specially for Cantilever fabrication. The main focus will be on the
most important and widely used techniques and will not discuss specialized methods. Microelectronic devices and information technologies have improved and will continue to
improve as a result of large-scale, commercial implementation of nanofabrication. The
motivation for these improvements is to increase the density of components, lower their cost, and
increase their performance per device and per integrated circuit.








